List of main publications:
T. Hirvikorpi, M. Vähä-Nissi, T. Mustonen, E. Iiskola, M. Karppinen, Atomic
Layer Deposited Aluminum Oxide Barrier Coatings for Packaging Materials,Thin
Solid Films, 518 (2010) 2654.
T. Hirvikorpi, M. Vähä-Nissi, A. Harlin, M. Karppinen, Comparison
of some coating techniques to fabricate barrier layers on packaging materials,
Thin Solid Films, 518 (2010) 5463.
T. Hirvikorpi, M. Vähä-Nissi, A. Harlin, J. Marles, V. Miikkulainen, M.
Karppinen, Effect of corona pre-treatment on the performance of gas barrier
layers applied by atomic layer deposition onto polymer-coated paperboard,
Appl. Surf. Sci., 257 (2010) 736–740.
T. Hirvikorpi, M. Vähä-Nissi, A. Harlin, M. Salomäki, J. Kankare, S. Areva,
J.T. Korhonen, M. Karppinen, Barrier properties of multilayered
polyelectrolyte complexes coated with atomic layer deposited Al2O3 layer,
Appl. Surf. Sci., submitted (2010).
T. Hirvikorpi, M. Vähä-Nissi, J. Vartiainen, P. Penttilä, J. Nikkola, A.
Harlin, R. Serimaa, M. Karppinen, Effect of heat-treatment on the
performance of gas barrier layers applied by atomic layer deposition onto
polymer-coated paperboard, J Appl. Polymer Sci., submitted (2010).
T. Hirvikorpi, M. Vähä-Nissi, A. Harlin, M. Karppinen, Atomic
layer deposition as a means to fabricate thin barrier layers on packaging
materials, ECNF 2010. Liege, Belgium. 22-25 March 2010.
T. Hirvikorpi, M. Vähä-Nissi, T. Mustonen, A. Harlin, Thin
Inorganic Barrier Coatings for Packaging Materials, TAPPI 2010 PLACE
Conference. Albuquerque, NM. 19-21 Apr 2010.
T. Hirvikorpi, M. Vähä-Nissi, A. Harlin, M. Karppinen, Atomic
layer deposition as a means to fabricate thin barrier layers on packaging
materials, NPD 2010. Helsinki, Finland. 24-26 May 2010
M. Vähä-Nissi, T. Hirvikorpi, T. Mustonen, M. Karppinen, A. Harlin Thin
film deposition techniques – steps towards more sustainable packages,
2010 TAPPI Intl Conf on Nano for the Forest Product Industry. Espoo, Finland.
27-29 September 2010
T. Kääriäinen, P. Maydannik, M-L Kääriäinen, D.Cameron, P. Johansson , K.
Lahtinen, J. Kuusipalo, Continuous Atomic Layer Deposition Process,
15th Technology Summit & Technology Platform. New Delhi, India. 26-27 Nov,
2009.
P. Maydannik, T. Kääriäinen, D.Cameron, A continuous ALD
process for deposition on flexible substrates, SVC 53rd Annual Technical
Conference. Orlando, FL. 19-22 Apr 2010.
T. Kääriäinen, D. Cameron D, K. Lahtinen, P. Johansson, J. Kuusipalo ,
Atomic Layer Deposition of Metal Oxide Films as Diffusion Barriers on Flexible
Packaging Materials, SVC 53rd Annual Technical Conference. Orlando, FL.
19-22 Apr 2010.
P. Johansson, K. Lahtinen, J. Kuusipalo, T. Kääriäinen, P. Maydannik, D.
Cameron, Atomic layer deposition process for barrier applications of
flexible packaging, TAPPI 2010 PLACE Conference. Albuquerque, NM. 19-21
Apr 2010.
P. Maydannik, T. Kääriäinen, D.Cameron, A continuous ALD
process for deposition on flexible substrates, AVS 10th International
Conference on Atomic Layer Deposition. Seoul, South-Korea. 20-23 June 2010.
P. Maydannik, T. Kääriäinen, D.Cameron, M Putkonen, Continuous
Atomic Layer Deposition process: towards roll-to-roll ALD, AVS 10th
International Conference on Atomic Layer Deposition. Seoul, South-Korea. 20-23
June 2010.
D. Cameron, P. Maydannik, T.Kääriäinen, Continuous and
roll-to-roll atomic layer deposition, Baltic ALD and German ALD
Conference. Hamburg, Germany. 16-17 Sep 2010.